The MOCVD Challenge (Record no. 2081)

MARC details
000 -LEADER
fixed length control field 01844nam a22002297a 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20240219121143.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 240219b |||||||| |||| 00| 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781138114937 (PB)
041 ## - LANGUAGE CODE
Language code of original eng
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.381
Item number RAZ
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Razeghi,Manijeh
245 ## - TITLE STATEMENT
Title The MOCVD Challenge
Remainder of title A survey of GaInAsP-InP and GaInAsP-GaAs for photonic and electronic device applications
250 ## - EDITION STATEMENT
Edition statement 2
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. Boca Raton
Name of publisher, distributor, etc. CRC Press
Date of publication, distribution, etc. 2011
300 ## - PHYSICAL DESCRIPTION
Page number xx, 779 p
440 ## - SERIES STATEMENT/ADDED ENTRY--TITLE
Title Electronic materials and devices series
505 ## - FORMATTED CONTENTS NOTE
Formatted contents note Introduction to Semiconductor Compounds. Growth Technology. In situ Characterization during MOCVD. Ex situ Characterization Techniques. MOCVD Growth of GaAs Layers. Growth and Characterization of the GaInP–GaAs System. Optical Devices. GaAs-Based Lasers. GaAs-Based Heterojunction Electron Devices Grown by MOCVD. Optoelectronic Integrated Circuits (OEICs). InP–InP System: MOCVD Growth, Characterization and Applications. GaInAs–InP System: MOCVD Growth, Characterization and Applications. GaInAsP–InP System: MOCVD Growth, Characterization, and Applications. MOCVD Growth, Characterization and Applications of III–V Semiconductor Strained Heterostructures. MOCVD Growth of III–V Heterojunctions and Superlattices on Silicon Substrates and their Applications. Optoelectronic Devices Based on Quantum Structures. Appendices. Index.
520 ## - SUMMARY, ETC.
Summary, etc. MOCVD is a widely used technique in research and industry. This book provides coverage of the MOCVD challenge. It presents a review of methods for producing ultra thin, accurately controlled epitaxial layers of semiconductor multilayers and microstructures deposited over a large range of substrates.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Electronic apparatus and appliances Materials
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Metal organic chemical vapor deposition
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Source of classification or shelving scheme Dewey Decimal Classification
Koha item type Books
952 ## - LOCATION AND ITEM INFORMATION (KOHA)
-- 6151
Holdings
Withdrawn status Lost status Source of classification or shelving scheme Damaged status Not for loan Collection code Home library Current library Date acquired Source of acquisition Cost, normal purchase price Inventory number Total Checkouts Full call number Barcode Date last seen Cost, replacement price Price effective from Currency Koha item type
    Dewey Decimal Classification     Non-fiction IIITDM Kurnool IIITDM Kurnool 19.02.2024 Narendra Publishing House 4793.20 NPH/23-24/IN-00392 DATED 26.12.2   621.381 RAZ 0005337 19.02.2024 4893.20 19.02.2024 INR Books
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