000			02095nam a22001697a 4500
005			20240205143736.0
008			240205b |||||||| |||| 00| 0 eng d
020			_a9781855739314
082			_a621.381 _bBUC
100			_aD Bucknall
245			_aNanolithography and Patterning Techniques in Microelectronics _cD Bucknall
260			_aUSA _bCRC _c2005
300			_a424 p.
505			_tCopolymer ordering; Templated synthesis for controlled 3D structural control; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Control of polymer topography; AFM based patterning; Patterning of confined polymer thin films; Ion beam patterning; Nanoprinting techniques; Photolithography beyond the diffraction limit; Standard printing techniques for unconventional methods; Microfluidics; Manipulation of biomolecules and reactions; Fabrication of organic display devices; Printing techniques for plastic electronics.
520			_aTechniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications.A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices.With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices.
942			_2ddc _cBK
999			_c2046 _d2046