000			03569cam a22004214a 4500
001			14123478
005			20221209125418.0
008			050928s2006 njua b 001 0 eng
010			_a 2005028448
015			_aGBA627486 _2bnb
016	7		_a013414729 _2Uk
020			_a0471784060
020			_a9780471784067
035			_a(OCoLC)ocm61821738
040			_aDLC _cDLC _dUKM _dBAKER _dC#P _dCOO _dDLC
042			_apcc
082	0	0	_a621.3815 _222 _bMAY
100	1		_aMay, Gary S.
245	1	0	_aFundamentals of semiconductor manufacturing and process control / _cGary S. May, Costas J. Spanos.
260			_a[Piscataway] : _bIEEE ; _aHoboken, N.J. : _bWiley-Interscience, _cc2006.
300			_axix, 463 p. : _bill. ; _c25 cm.
504			_aIncludes bibliographical references and index.
505			_tIntroduction to semiconductor manufacturing _tTechnology overview _tProcess monitoring _tStatistical fundamentals _tYield modeling _tStatistical process control _tStatistical experimental design _tProcess modeling _tAdvanced process control _tProcess and equipment diagnosis
520			_aA practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual
650		0	_aSemiconductors
650		0	_aIntegrated circuits
650		0	_aProcess control
650		0	_xDesign and construction.
650		0	_xDesign and construction.
650		0	_xStatistical methods.
700	1		_aSpanos, Costas J.
856	4	1	_3Table of contents _uhttp://www.loc.gov/catdir/toc/ecip061/2005028448.html
856	4	2	_3Publisher description _uhttp://www.loc.gov/catdir/enhancements/fy0660/2005028448-d.html
856	4	2	_3Contributor biographical information _uhttp://www.loc.gov/catdir/enhancements/fy0740/2005028448-b.html
906			_a7 _bcbc _corignew _d1 _eecip _f20 _gy-gencatlg
942			_2ddc _cBK
999			_c1882 _d1882