Nanolithography and Patterning Techniques in Microelectronics (Record no. 2046)
[ view plain ]
| 000 -LEADER | |
|---|---|
| fixed length control field | 02095nam a22001697a 4500 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20240205143736.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 240205b |||||||| |||| 00| 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9781855739314 |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381 |
| Item number | BUC |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Personal name | D Bucknall |
| 245 ## - TITLE STATEMENT | |
| Title | Nanolithography and Patterning Techniques in Microelectronics |
| Statement of responsibility, etc. | D Bucknall |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | USA |
| Name of publisher, distributor, etc. | CRC |
| Date of publication, distribution, etc. | 2005 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Page number | 424 p. |
| 505 ## - FORMATTED CONTENTS NOTE | |
| Title | Copolymer ordering; Templated synthesis for controlled 3D structural control; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Control of polymer topography; AFM based patterning; Patterning of confined polymer thin films; Ion beam patterning; Nanoprinting techniques; Photolithography beyond the diffraction limit; Standard printing techniques for unconventional methods; Microfluidics; Manipulation of biomolecules and reactions; Fabrication of organic display devices; Printing techniques for plastic electronics. |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc. | Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications.A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices.With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices. |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Source of classification or shelving scheme | Dewey Decimal Classification |
| Koha item type | Books |
| 952 ## - LOCATION AND ITEM INFORMATION (KOHA) | |
| -- | 6064 |
| Withdrawn status | Lost status | Source of classification or shelving scheme | Damaged status | Use restrictions | Not for loan | Collection code | Home library | Current library | Shelving location | Date acquired | Source of acquisition | Inventory number | Total Checkouts | Full call number | Barcode | Date last seen | Cost, replacement price | Price effective from | Currency | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Dewey Decimal Classification | Restricted Access | Not For Loan | Reference | IIITDM Kurnool | IIITDM Kurnool | General Stacks | 05.02.2024 | New India Book Agency | 4850DT 29-12-2023 | 621.381 BUC | 0005283 | 05.02.2024 | 290.00 | 05.02.2024 | USD | Reference |